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Photo chemical etching is utilized as a vital processing method in the field of electronic industry and other various industrial field.
We begin photo chemical etching in 1977, and since then we consistently adopt to modern installation and upmost quality control system while delivering ultraprecise products to world's market. |
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We need various know-how in order to deliver high accuracy products.
And at the same time, we need most-advanced machine.
In particular, precise pattern transfer technique is the key factor in photo etching, we can meet up-to-date exposure method from sheet-feed to continuous method and from film to glass original art. |
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In order to achieve high precision product at lower cost, we adopted our own continuous etching machine and responding to our customer's demand with large capacity.
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Lead frame, the typical example of etching product, plays important role in semiconductor package.
We respond to the demand of increasing pin qty and fine-pitch.
We can correspond to the palladium plating which has drawn wide attention. |
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Supporting spring for magnetic head is also the typical example of etching products.
We hold one of the world's largest production volume in suspension which is the supporting spring for the HDD.
We can correspond to the precise half etch products. |
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electromechanical parts is actively pursued along with device miniaturization.
We developed CFSA ,Circuit Flex
Suspension Assembly, which integrates wired circuit from magnetic head with suspension and we established mass production system as well as ISB, Integrated Suspension Blanks. |
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We produce precise functional product such as tools and carrying trays by adding various backend process such as bending, spot welding and laser welding to the high-precision metal products produced by photo etching. |
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